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• W2381021180 abstract "Low energy ion beam assisted deposition (IBAD) was employed to prepare Ag films on Mo/Si(100) substrate. It was found that Ag films deposited by the sputtering method were with (111) preferred orientation. Ag films exhibited mixed (111) and (100) orientations if the growing films were bombarded by 500 eV Ar{sup +} beam along normal direction with Ion/Atom arrival ratio of 0.18. Ag films exhibited highly preferred (111) orientation at incidence angle of 54.7 degree. (authors)" @default.
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• W2381021180 date "2005-01-15" @default.
• W2381021180 modified "2023-09-26" @default.
• W2381021180 title "Low energy Ar~+ beam assisted deposition of Ag(111) films" @default.
• W2381021180 hasPublicationYear "2005" @default.
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