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- W2381281644 abstract "The model proposed by Joensson and Hogmark takes the parameter, C, as a constant for different film-substrate systems. The parameter was modified in the present paper according to different hardness ratio of film to substrate and used them to study the variation of the hardness of PCVD Ti(C, N) films with the composition and the microstructure.Comparing with bulk materials, Ti(C, N) films have a relative high hardness due to the smaller crystal size and the higher compressive residual stress. It is controlled by the carbon content and hold a linear increase with the carbon content for a definite deposition technique." @default.
- W2381281644 created "2016-06-24" @default.
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- W2381281644 date "1995-01-01" @default.
- W2381281644 modified "2023-09-25" @default.
- W2381281644 title "ON THE COMPOSITE AND INTRINSIC HARDNESS OF Ti(C, N) FILMS" @default.
- W2381281644 hasPublicationYear "1995" @default.
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