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- W2382319255 abstract "A method for accelerated predictions of the long-term anneal effects was presented. In order to find the correspondence between two anneals time, our estimating conditions were that each isochronal step was equal to the duration of the isothermal anneal leading to the same level of charge de trapping. The long term isothermal behavior at 100℃ and 25℃ of the type CC4007 CMOS devices were predicted by using isochronal anneal data of 25-250℃ and compared with an experimental isothermal. We note a good agreement between simulation and experiment." @default.
- W2382319255 created "2016-06-24" @default.
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- W2382319255 date "2005-01-01" @default.
- W2382319255 modified "2023-09-26" @default.
- W2382319255 title "One accelerated method for predicting thermal annealing effects in post-irradiation CMOS devices" @default.
- W2382319255 hasPublicationYear "2005" @default.
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