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- W2382809251 abstract "The direct-current megnetron sputtering and the anodic oxidation process were adopted to prepare the Ta2O5 thin film.In the anodic oxidation process,a soupcon of glycol was appended in H3PO4 electrolyte for the preparation of the Ta2O5 film.The composite of the Ta2O5 thin film was characterized by X-ray diffractions(XRD)and pectroscope(EDS),respectively.The results indicated the Ta2O5 film was amorphous and there was no β-Ta2O5 srystalline phase.The electrical breakdown field intensity test system was employed to study the insulation performance of the Ta-Ta2O5-Al composite films(MIM structure)in the FED component.The results indicated that the Ta-Ta2O5-Al composite films had higher breakdown field intensity." @default.
- W2382809251 created "2016-06-24" @default.
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- W2382809251 date "2011-01-01" @default.
- W2382809251 modified "2023-09-22" @default.
- W2382809251 title "Preparation and Performance of the Ta-Ta_2O_5-Al Composite Films in the MIM Structure's FED Component" @default.
- W2382809251 hasPublicationYear "2011" @default.
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