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- W2383732728 abstract "The reaction process on the surface of solid gases during nitriding of tantalum was discussed thermodynamically and dynamically. The effects of technical parameters such as pressure, temperature, electrical current density and voltage on the surface process were analyzed theoretically. The nitriding layers on tantalum surfaces with high hardness and better roughness were obtained with the help of plasma at low temperature. The layers were composed of the solid solution of tantalum and surface layers, which are amorphous phase or/and compound Ta 6N 2.57 ." @default.
- W2383732728 created "2016-06-24" @default.
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- W2383732728 date "2000-01-01" @default.
- W2383732728 modified "2023-09-25" @default.
- W2383732728 title "Analysis of interface reactions during plasma nitriding of tantalum" @default.
- W2383732728 hasPublicationYear "2000" @default.
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