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- W2386022888 abstract "In this paper,the advantage and disadvantage of the existing fabrication process for the metal micromesh sieves were discussed.An optimized UV-LIGA technique,based on SU-8 photoresist process,was successfully applied to manufacture the thick nickel hexagonal micromesh sieve-sheets with high open area.The key process points of fabrication method were optimized and the performance of sieve sample was examined and analyzed.The experimental results show that,using the optimized experimental process parameters of some key fabrication steps(before-exposure bake:65 ℃,20 min,95 ℃,20 min;exposure energy:260 mJ/cm2;post-exposure bake:65 ℃,10 min,95 ℃,15 min;accessorial measurements:ultrasonic developing,placing in air,cooling with stove closed;assisting low air-pressure alternately and temperature-gradient micro electroforming technique),a nickel hexagonal micromesh sieve with high open area is fabricated.Then main body of the nickel Micromesh Sieve has high open area of 88%,thickness of(120±3) μm,appropriate dimensional accuracy,good appearance quality." @default.
- W2386022888 created "2016-06-24" @default.
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- W2386022888 date "2009-01-01" @default.
- W2386022888 modified "2023-09-26" @default.
- W2386022888 title "Fabrication of Thick Metal Micromesh Sieves with High Open Area Using the UV-LIGA Process" @default.
- W2386022888 hasPublicationYear "2009" @default.
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