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- W2386374865 abstract "Large-sized diamond crystal with the size of 500 μm was deposited on Si substrate in a home-made microwave plasma assisted CVD reactor(2.45 GHz,5 kW,water-cooled stainless steel chamber) using edge effect,and the deposition speed was 50 μm/h.Meanwhile,a nature diamond with flaw on its surface was used to be homoepitaxial growth at the deposition speed of 70 μm/h.The diamonds deposited on the edge region and the center region of the substrate and the surface morphology of the grown diamond were characterized by scanning electron microscopy(SEM) and micro-Raman spectroscopy.The results show that the diameter and the quality of diamonds deposited on the edge of the substrate is larger and higher than the diamonds deposited on the center of the substrate.The main reason for the edge effect is concluded that the temperature and the electric field intensity on the edge region are higher than the center of region of the substrate after a series of analysis and experiments." @default.
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- W2386374865 date "2011-01-01" @default.
- W2386374865 modified "2023-09-27" @default.
- W2386374865 title "Study on Growth of Large-sized Diamonds at the Substrate Edge by MPCVD" @default.
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