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- W2388517017 abstract "SiC thin film has many preferred properties,such as low density,high thermal conductivity,low thermal expansion coefficient,high hardness and so on.In this paper,the two most commonly used methods,chemical vapor deposition and magnetron sputtering technology,were reported.And their respective advantages on preparing SiC thin film were compared. The recent progress of studying on the optical properties and photoluminescence of SiC thin film were also mentioned in this paper." @default.
- W2388517017 created "2016-06-24" @default.
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- W2388517017 date "2009-01-01" @default.
- W2388517017 modified "2023-09-23" @default.
- W2388517017 title "RECENT PROGRESS OF THE OPTICAL PROPERTIES AND THE PREPARATION METHODS OF SiC THIN FILM" @default.
- W2388517017 hasPublicationYear "2009" @default.
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