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- W2389071798 abstract "Silicon is the basis of the microelectronics industry,and silicon and germanium surfaces and interfaces have been under intensive investigation for several decades.However,compared to the questions that are being raised by nanoscience and technology,our knowledge in this context is still quite incomplete.Accordingly,by means of scanning tunneling microscopy and low|energy electron diffraction,we have been carrying out a systematic and comparative investigation of the stability,faceting,nanofaceting,surface specific free energy,and atomic structure of high|index germanium and silicon surfaces,along with some surface dynamic processes.These results are expected to be interesting not only from the point of view of basic science,but should also be helpful to applications such as selection of substrates for semiconductor heteroepitaxial growth and preparation of templates for the growth of nanowires and nanodots." @default.
- W2389071798 created "2016-06-24" @default.
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- W2389071798 date "2000-01-01" @default.
- W2389071798 modified "2023-09-25" @default.
- W2389071798 title "ATOMIC STRUCTURES AND DYNAMIC PROCESSES OF Ge AND Si SURFACES" @default.
- W2389071798 hasPublicationYear "2000" @default.
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