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- W2389076616 abstract "Nano-particles of CeO2 were prepared in alcohol/water mixed solvents under microwave radiation using Ce(NO3)3·6H2O and HMT as starting materials.The phase and morphology of samples were characterized by X-ray diffraction(XRD),transmission electron microscope(TEM),Fourier transform infrared spectroscopy(FT-IR) and BET-N2.As-prepared nano-CeO2 particles were collocated into polishing slurry for chemical-mechanical polishing of Si(100) and Si(111).The polishing behavior of nano-sized CeO2 was studied with atomic force microscope(AFM).The results indicate that microwave radiation and alcohol/water mixed solvents are beneficial to the preparation of nano-CeO2 powder,which is smaller in size and displays better dispersal performance,and microwave radiation can expedite the reaction rate effectively.At last,ultra-smooth surfaces of Si(100) and Si(111) with roughness(Ra) of 0.275 nm and 0.110 nm within 2 μm×2 μm area polished by nano-sized CeO2 were obtained respectively,undulation of which was very small." @default.
- W2389076616 created "2016-06-24" @default.
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- W2389076616 date "2009-01-01" @default.
- W2389076616 modified "2023-09-24" @default.
- W2389076616 title "Preparation Nano-CeO_2 Particles and Its Polishing Performance for Si(100) and Si(111)" @default.
- W2389076616 hasPublicationYear "2009" @default.
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