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- W2389722375 abstract "Effect of the reactive gases pressure on morphology and Raman spectroscopy of diamond films deposited by hot filament chemical vapor deposition (HFCVD) was systematically investigated.A new process was proposed to deposit the nanocrystalline diamond films using HFCVD technique. The results show that the high quality nanocrystalline diamond film can be deposited on a 50mm diameter Si substrate by reducing the reactive gases pressure. The grain size was observed to be approximately 10nm by HRTEM. The lattice spacing d111estimated from{111}planes is 0.2086nm,which is close to the standard value 0.205 9nm. The grain was surrounded by the sp2 carbon structure. Both the sharp diamond peak and obvious graphite peak were revealed by ultraviolet(UV)Raman spectroscopy." @default.
- W2389722375 created "2016-06-24" @default.
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- W2389722375 date "2003-01-01" @default.
- W2389722375 modified "2023-09-25" @default.
- W2389722375 title "Synthesis of Nanocrystalline Diamond Films Deposited by Hot Filament CVD" @default.
- W2389722375 hasPublicationYear "2003" @default.
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