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- W2391955003 abstract "The aim of the paper is to study the phase composition and the mullitization behavior of the Al_2O_3-SiO_2 coating deposited by CVD at 550℃ using AlCl_3-SiCl_4-H_2-CO_2 precursor gaseous.The DTA and XRD were used to examine the mullitization behavior of the coating.The as-deposited coating was composed of γ-Al_2O_3 and amorphous SiO_2. The DTA curve has four peaks.The very weak exothermic peak appeared at about 793℃ represented the formation of mullite.The first sharp exothermic peak appeared at about 984℃ represented the formation of δ-Al_2O_3.The very weak endothermic peak appeared at about 1240℃ represented the formation of α-Al_2O_3.The second sharp exothermic peak appeared at about 1337℃ also represented the formation of mullite.The results indicate the CVD process was no-oxidation and the Al_2O_3-SiO_2 coating can become into mullite-alumina coating by heat-treating it at 1350℃ for 2h." @default.
- W2391955003 created "2016-06-24" @default.
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- W2391955003 date "2005-01-01" @default.
- W2391955003 modified "2023-09-25" @default.
- W2391955003 title "Mullitization Behavior of Al_2O_3-SiO_2 Coating Deposited by CVD" @default.
- W2391955003 hasPublicationYear "2005" @default.
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