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- W2391965676 abstract "Taking the reactive system of TiCl4-CH3SiCl3-H2-Ar, the Ti-Si-C ternary coating was obtained by LPCVD. The changes of phase composition, morphology and structure of the coating made at 1 100~1 250 ℃, were examined by X-ray diffraction, SEM, EDS and EPMA. The results show that the coating of TiC is formed at 1 100 ℃ without Ti3SiC2 while between 1 150 ℃ and 1 250 ℃ the coating is mainly composed of TiC and Ti3SiC2. The grain preferred orientation of Ti3SiC2 is along the ?104? crystal plane at 1 200 ℃ while grows irregularly at 1 150 ℃ and 1 250 ℃. The coating has the structure of the porous fine column and particle accumulated and fitted together at 1 150 ℃. When the temperature is between 1 200 ℃ and 1 250 ℃, the coating is divided into two layers, and the inner transition layer of columnar crystal sructure is mainly composed of TiC, while the outer layer is composited of the phase of TiC and Ti3SiC2 and has the layer staggerly stacked structure." @default.
- W2391965676 created "2016-06-24" @default.
- W2391965676 creator A5025562573 @default.
- W2391965676 date "2014-01-01" @default.
- W2391965676 modified "2023-09-28" @default.
- W2391965676 title "Effect of temperature on the formation law of Ti_3SiC_2 in CVD prepared Ti-Si-C codeposited coating" @default.
- W2391965676 hasPublicationYear "2014" @default.
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