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- W2391990752 abstract "W/Si multilayers were deposited by magnetron sputtering in an Ar atmosphere at different pres-sures。A study of interfacial roughness has been carried out using low-angle x-ray diffraction.Theresults showed that interfacial roughness increased with the increflse of Ar pressure。The effect of Arpressures on interfacial roughness is discussed。" @default.
- W2391990752 created "2016-06-24" @default.
- W2391990752 creator A5074952184 @default.
- W2391990752 date "1995-01-01" @default.
- W2391990752 modified "2023-09-26" @default.
- W2391990752 title "THE EFFECT OF Ar PRESSURE ON INTERFACIAL ROUGHNESS FORW/Si MULTILAYERS" @default.
- W2391990752 hasPublicationYear "1995" @default.
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