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- W2392874505 abstract "Scale continuity and technological integrality of nanofabrication is studied in this paper. Projection focused ion multi-Beam was brought forward to solve problems appeared in industrialization of nanofabrication. It closes the presently existing machining gap of 0.5~5μm between the classical micro machining technologies and semiconductor patterning technologies. It has achieved the combination of top-down structuring with selective bottom-up self-assembly techniques during the scale of 1~100nm. As regard to nanometrology, scanning probe technology is researched in detail. A “three-beam” system can effectively reduce sample damage by integrating Ar ion beam into a dual-beam system of focused ion beam and electron beam, which will accelerate the development of nanometrology." @default.
- W2392874505 created "2016-06-24" @default.
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- W2392874505 date "2006-01-01" @default.
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- W2392874505 title "Research on industrialization of nanofabrication and nanometrology" @default.
- W2392874505 hasPublicationYear "2006" @default.
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