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- W2393085405 abstract "High quality Zn_(0.9)Li_(0.1)O thin films with smooth surface have been successfully deposited on glass substrate under high RF power(550 W) by RF magnetron sputtering,and the optical properties of the films were investigated by room-temperature transmittance and photoluminescence(PL) spectroscopy.The films with good transmittance were obtained in visible range.The optical band-gap of the film was 3.29 eV,which was much lower than that of the film deposited under RF power of 200 W(3.44 eV).The photoluminescence results showed that 399 nm peak induced by Li dopant was dominant in the PL spectra,which was different from the behaviors of the film deposited under low RF power.After annealed at 560 ℃,the intensity of 370 nm peak increased." @default.
- W2393085405 created "2016-06-24" @default.
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- W2393085405 date "2006-01-01" @default.
- W2393085405 modified "2023-10-11" @default.
- W2393085405 title "Optical Properties and Surface Morphology of ZnO:Li Thin Films Sputtering Deposited under High RF Power" @default.
- W2393085405 hasPublicationYear "2006" @default.
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