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- W2393319790 abstract "With the characteristic dimension become more and more miniature, the cost of mask fabrication greatly increased. In order to reduce the cost of mask fabrication, the technique of maskless optical lithography becomes the center of micro-electronic industry. A method of maskless optical digital lithography based on DMD, which can realize precise exposure with step, was introduced in this paper; and the principle of design and implementation of the apparatus applied the method were analysed in detail. Finally, exposure experiments using thick photoresist were carried out; the results showed the linewidth of micrometer, steep sidewall, good conjunction of lines and digital exposure of large area can be realized by the designed apparatus." @default.
- W2393319790 created "2016-06-24" @default.
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- W2393319790 date "2008-01-01" @default.
- W2393319790 modified "2023-09-23" @default.
- W2393319790 title "The method and equipment of maskless step digital lithography based on DMD" @default.
- W2393319790 hasPublicationYear "2008" @default.
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