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- W2393590230 abstract "The SiGe epilayer with a linear graded buffer was grown by ultra high vacuum chemical vapor deposition at 780℃ and the double crystal X ray diffraction(DCXRD) is employed to investigate the influence of buffer layer on epilayer.The DCXRD measurements show that the crystalline quality of epilayer is improved due to linear variation of compositions in the buffer layer." @default.
- W2393590230 created "2016-06-24" @default.
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- W2393590230 date "1999-01-01" @default.
- W2393590230 modified "2023-09-25" @default.
- W2393590230 title "Stran Relaxation in SiGe Epilayer Grown by Ultra High Vacuum Chemical Vapor Deposition" @default.
- W2393590230 hasPublicationYear "1999" @default.
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