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- W2393653216 abstract "Direct current plasma enhanced chemical vapor deposition(PECVD) was employed to fabricate fluorine doped carbon films with CF4,CH4 and H2 as precursor gases under different substrate temperatures.The bonding structures of the films were revealed by Fourier infrared spectrometer,the sp2 and sp3 hybrid carbon status was probed by Raman spectrometer,and the film hardness and friction were investigated by the nanoindentation instrument and UMT-2MT reciprocating tribometer,respectively.The results show that F is mainly presented in the forms of C-F3 and C-Fx(x=1,2,3) groups in the films.The film fabricated in the substrate temperature ranging from no heat to 500 ℃ showed relatively low friction coefficient about less than 0.020.The lowest friction coefficient of the film was observed about 0.016 at 400 ℃,and the film structure would be destroyed and the mechanical properties worsened significantly while the substrate temperature exceeded 600 ℃." @default.
- W2393653216 created "2016-06-24" @default.
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- W2393653216 date "2012-01-01" @default.
- W2393653216 modified "2023-09-23" @default.
- W2393653216 title "Influence of Substrate Temperature on the Tribological Properties of Fluorinated Diamond-like Carbon Films" @default.
- W2393653216 hasPublicationYear "2012" @default.
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