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- W2394173318 abstract "Under far from equilibrium conditions, the formation mechanism of solid can be studied in terms of the dynamic scaling theory. The roughness and dynamic scaling behavior of the Fe-N thin films were studied by atomic force microscopy and grazing incidence X-ray scattering. The results indicate that the roughness of the surface increases with increasing sputtering time during the course of magnetron sputtering, and the surface exhibits a fractal characteristic. While the Fe-N films prepared by compound technology—combining magnetron sputtering with plasma based ion implantation are not in agreement with the fractal theory." @default.
- W2394173318 created "2016-06-24" @default.
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- W2394173318 date "2005-01-01" @default.
- W2394173318 modified "2023-09-24" @default.
- W2394173318 title "Dynamic scaling behavior of iron nitride thin films prepared by magnetron sputtering and ion implantation" @default.
- W2394173318 hasPublicationYear "2005" @default.
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