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- W2394200154 abstract "Based on aluminum-induced solid-phase crystallization method of amorphous silicon thin film,the periodic structure of Al/Si…Al/Si/glass films were prepared by DC magnetron sputter ion plating technique.The Al/Si multilayer films were annealed for different time at 500 ℃ in vacuum annealing furnace,and the annealed films were analyzed by TEM to obtain the variation patterns of cross-section topography of the annealed films.The essential influence of annealing time on crystallization process of aluminum induced amorphous silicon films were discussed combined with diffusion process.The results show that: During the aluminum-induced solid-phase crystallization process of amorphous silicon thin film,the growth of crystalline silicon films mainly depends on increase in the number of Si initial crystalline nucleation formed by the presence of Al in the early stages of annealing process.With prolonged annealing time,the growth of crystalline silicon thin film was achieved by silicon atoms diffusion to the location of the initial crystalline nucleation and the epitaxial growth in the area of critical concentration line having been promoted.The cross-section topography of Al/Si thin film shows the twinning-crystalline structures grown along the Si(111) crystal plane after annealing for 1 h at 500 ℃." @default.
- W2394200154 created "2016-06-24" @default.
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- W2394200154 date "2011-01-01" @default.
- W2394200154 modified "2023-09-24" @default.
- W2394200154 title "Effect of Annealing Time on Crystallization Process of Aluminum Induced Amorphous Silicon Films" @default.
- W2394200154 hasPublicationYear "2011" @default.
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