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- W2403642933 abstract "In this paper, we directly compare the program efficiency of conventional channel hot electron (CHE) injection methods and a novel hot electron injection methods using substrate forward biases in our silicon-oxide-nitride-oxide-silicon (SONOS) cell. Compared with conventional CHE injection methods, the proposed injection method showed improved program efficiency including faster program operation at lower bias voltages as well as localized trapping features for multi-bit operation with a threshold voltage difference of 1 V at between the forward and reverse read. This program method is expected to be useful and widely applied for future nano-scale multi-bit SONOS memories." @default.
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- W2403642933 date "2010-01-01" @default.
- W2403642933 modified "2023-09-27" @default.
- W2403642933 title "A Study on The Comparison of The Program Efficiency in The Conventional CHE Injection Method and a novel Hot Electron Injection Method Using A Substrate forward Bias" @default.
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