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• W2404533989 abstract "We present a new procedure for pretreatment seeding by ultrasonic agitation of silicon substrates in diamond nano-powder suspensions to which HF and KOH were added X-ray photoelectron spectroscopy (XPS) was used to measure the surface coverage by diamond nuclei immediately after the pretreatment. Coverage percentages of 70, 40 and 55% were obtained for the HF, KOH and the original diamond slurry, respectively. The seeding density (SD) was calculated from the known nano-particles size, determined independently from X-ray diffraction of the powder. For nano-particle size of ∼6 nm, we obtain nominal seeding densities of the order ∼1012 cm−2. The advantage of the high coverage was most evident for films deposited at low substrate temperature (570 °C). The potential of the new seeding procedure and the XPS characterization method are discussed." @default.
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• W2404533989 date "1999-03-01" @default.
• W2404533989 modified "2023-09-23" @default.
• W2404533989 title "Nano-particles seeding and its characterization by X-ray photoelectron spectroscopy (XPS)" @default.
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• W2404533989 doi "https://doi.org/10.1016/s0925-9635(98)00399-9" @default.
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