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• W2408176912 endingPage "06HC03" @default.
• W2408176912 startingPage "06HC03" @default.
• W2408176912 abstract "Abstract β-FeSi 2 thin films were epitaxially grown on p-type Si(111) substrates at a substrate temperature of 560 °C and Ar pressure of 2.66 × 10 −1 Pa by radio-frequency magnetron sputtering (RFMS) using a sintered FeSi 2 target, without postannealing. The resultant n-type β-FeSi 2 /p-type Si heterojunctions were evaluated as near-infrared photodiodes. Three epitaxial variants of β-FeSi 2 were confirmed by X-ray diffraction analysis. The heterojunctions exhibited typical rectifying action at room temperature. At 300 K, the heterojunctions showed a substantial leakage current and minimal response for irradiation of near-infrared light. At 50 K, the leakage current was markedly reduced and the ratio of the photocurrent to dark current was considerably enhanced. The detectivity at 50 K was estimated to be 3.0 × 10 11 cm Hz 1/2 /W at a zero bias voltage. Their photodetection was inferior to those of similar heterojunctions prepared using facing-target direct-current sputtering (FTDCS) in our previous study. This inferiority is likely because β-FeSi 2 films prepared using RFMS are located in plasma and are damaged by it." @default.
• W2408176912 created "2016-06-24" @default.
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• W2408176912 date "2016-05-24" @default.
• W2408176912 modified "2023-09-27" @default.
• W2408176912 title "Epitaxial growth of β-FeSi₂ thin films on Si(111) substrates by radio frequency magnetron sputtering and their application to near-infrared photodetection" @default.
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• W2408176912 doi "https://doi.org/10.7567/jjap.55.06hc03" @default.
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