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- W2412423856 abstract "A continuous-gradient approach of material evaporation is employed by L. Shao, M. Käll, and co-workers to fabricate nanostructures with varying geometric parameters such as thickness, lateral positioning, and orientation on a single substrate. This method for mask lithography, described on page 4658, allows continuous tuning of the physical properties of a sample. The technique is highly valuable in simplifying the overall optimization process for constructing metasurfaces." @default.
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- W2412423856 date "2016-06-01" @default.
- W2412423856 modified "2023-09-24" @default.
- W2412423856 title "Metasurfaces: Continuous-Gradient Plasmonic Nanostructures Fabricated by Evaporation on a Partially Exposed Rotating Substrate (Adv. Mater. 23/2016)" @default.
- W2412423856 doi "https://doi.org/10.1002/adma.201670163" @default.
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