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• W2412851387 abstract "Focusing on the challenges of wafer fabs with multiple tools and high-mix products, this study aims to propose a decision-based virtual metrology framework to reduce the metrology cost and enhance productivity. An empirical study was conducted in a leading semiconductor company in Taiwan to validate the effectiveness of proposed approach for controlling overlay errors in lithography processes while ensuring the quality level. The results have shown practical viability of the proposed approach for reducing sampling rate and metrology cost." @default.
• W2412851387 created "2016-06-24" @default.
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• W2412851387 date "2016-04-01" @default.
• W2412851387 modified "2023-09-25" @default.
• W2412851387 title "Manufacturing intelligence and smart production for industry 3.5 and empirical study of decision-based virtual metrology for controlling overlay errors" @default.
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• W2412851387 doi "https://doi.org/10.1109/vlsi-dat.2016.7482565" @default.
• W2412851387 hasPublicationYear "2016" @default.
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