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• W2425800401 abstract "To deposit an ultrathin dielectric onto WSe2, monolayer titanyl phthalocyanine (TiOPc) is deposited by molecular beam epitaxy as a seed layer for atomic layer deposition (ALD) of Al2O3 on WSe2. TiOPc molecules are arranged in a flat monolayer with 4-fold symmetry as measured by scanning tunneling microscopy. ALD pulses of trimethyl aluminum and H2O nucleate on the TiOPc, resulting in a uniform deposition of Al2O3, as confirmed by atomic force microscopy and cross-sectional transmission electron microscopy. The field-effect transistors (FETs) formed using this process have a leakage current of 0.046 pA/μm(2) at 1 V gate bias with 3.0 nm equivalent oxide thickness, which is a lower leakage current than prior reports. The n-branch of the FET yielded a subthreshold swing of 80 mV/decade." @default.
• W2425800401 created "2016-06-24" @default.
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• W2425800401 date "2016-06-29" @default.
• W2425800401 modified "2023-10-06" @default.
• W2425800401 title "Atomic Layer Deposition of Al₂O₃ on WSe₂ Functionalized by Titanyl Phthalocyanine" @default.
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• W2425800401 doi "https://doi.org/10.1021/acsnano.6b02648" @default.
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