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- W2437906902 abstract "The subject of reactive phase formation in multilayer thin films of varying periodicity has stimulated much research over the past few years. Recent studies have sought to understand the reactions that occur during the annealing of Ni/Al multilayers. Dark field imaging from transmission electron microscopy (TEM) studies in conjunction with in situ x-ray diffraction measurements, and calorimetry experiments isothermal and constant with in situ x-ray diffraction measurements, and calorimetry experiments (isothermal and constant heating rate), have yielded new insights into the sequence of phases that occur during annealing and the evolution of their microstructure. In this paper we report on reactive phase formation in sputter-deposited 1Ni:3Al multilayer thin films with a periodicity {Lambda} (the combined thickness of an aluminum and nickel layer) from 2.5 to 320 nm. A cross-sectional TEM micrograph of an as-deposited film with a periodicity of 10 nm is shown." @default.
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- W2437906902 date "1996-12-31" @default.
- W2437906902 modified "2023-09-24" @default.
- W2437906902 title "Characterization of reactive phase formation in sputter-deposited Ni/Al multilayer thin films using transmission electron microscopy" @default.
- W2437906902 hasPublicationYear "1996" @default.
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