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• W2442595682 abstract "Antireflective Si subwavelength structures (SWSs) are fabricated after the texturing of nano-scale holes directly onto micro-scale inverted pyramid arrays. Thermally agglomerated Au catalysts and Au-assisted chemical etching adjusted the featured nanohole sizes that determined surface reflection. When nano-scale SWSs were textured into micro-scale inverted pyramids, the total reflectance was dramatically decreased to 2.9% in a wavelength region of 200–1100 nm. Additionally, the average specular reflectance value was below 3.6% up to the incident angle of 60°. The surface reflection was efficiently suppressed by combining the light trap of microstructures and anti-reflectance of nanostructures. This technique demonstrated the feasibility of nano/micro double textured structures for application in high-performance optical devices." @default.
• W2442595682 created "2016-06-24" @default.
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• W2442595682 date "2016-10-01" @default.
• W2442595682 modified "2023-10-16" @default.
• W2442595682 title "Nano/micro double texturing of antireflective subwavelength structures on inverted pyramids" @default.
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• W2442595682 doi "https://doi.org/10.1016/j.solener.2016.06.009" @default.
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