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- W24474227 abstract "Voltage profiles of the source-drain region of a CMOS transistor with 75nm gate architecture taken from an off-the-shelf Intel PIII processor are presented. The sample preparation using a dual beam system is discussed as well as details of the electron optical setup of the microscope. Special attention is given to the analysis of the reconstructed holograms." @default.
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- W24474227 date "2003-04-01" @default.
- W24474227 modified "2023-10-15" @default.
- W24474227 title "Holographic voltage profiling on 75nm gate architecture CMOS devices" @default.
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- W24474227 doi "https://doi.org/10.1016/s0304-3991(02)00337-6" @default.
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