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- W2461088082 abstract "TiO2 thin films are deposited from oxygen/titanium tetraisopropoxide inductively coupled radiofrequency plasmas at low temperature and pressure by a RF-biased PECVD technique. In such a process, the substrate biasing effect (Vb) on the related film composition, structure, morphology, and optical properties are investigated. The results show that the O:Ti concentration ratio in all the films is roughly in stoichiometric proportion of 2, and the binding energy difference between the O 1s and Ti 2p3/2 levels indicates the formal valence state Ti4+ in all the films. The phase transformation from anatase to rutile is identified by Raman spectroscopy. At the floating potential, the first growth stage yields a well organized columnar layer, ∼90 nm in thickness, and this layer within a thick film (∼365 nm) has roughly the same optical properties as the thin film of ∼90 nm which is separately deposited. However, the columnar structure can be eliminated by using |Vb| ≧ 50 V. Spectroscopic ellipsometry is used to obtain the film optical properties, and appropriate fitting parameters have been found for the measured data." @default.
- W2461088082 created "2016-07-22" @default.
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- W2461088082 date "2016-09-01" @default.
- W2461088082 modified "2023-09-24" @default.
- W2461088082 title "Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O2/TTIP helicon reactor" @default.
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- W2461088082 doi "https://doi.org/10.1016/j.vacuum.2016.07.004" @default.
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