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- W2466258104 abstract "We describe experiments using a molecular fluorine (i.e., F2 dimer) laser operating at 157 nm as a VUV source for high-resolution photolithography. The F2 excimer laser is now the only commercially available laser with high average power at a wavelength as short as 157 nm. Using this laser as a source for contact lithography, we made resist lines as narrow as 150 nm, the smallest features yet reproduced by photolithography." @default.
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- W2466258104 date "1984-01-01" @default.
- W2466258104 modified "2023-09-26" @default.
- W2466258104 title "Photolithography with VUV Lasers" @default.
- W2466258104 doi "https://doi.org/10.1364/cleo.1984.fd1" @default.
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