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- W2467736250 abstract "In this chapter we describe the experimental techniques used in this work to deposit and characterise the (mathrm{Al}_2mathrm{O}_3) films. Deposition of almost all (mathrm{Al}_2mathrm{O}_3) films examined in this work was performed by the APCVD method, except in a few cases where (mathrm{Al}_2mathrm{O}_3) was deposited by ALD. Therefore we begin in Sect. 3.1 with a detailed description of the APCVD deposition technique and the APCVD system used to deposit the (mathrm{Al}_2mathrm{O}_3) passivation layers, including a discussion of the various options for the chemical precursor. The details of the more established ALD process are given briefly in Sect. 3.2, where we also describe the general procedures used for sample preparation. Finally, in Sect. 3.3 we describe the principal experimental techniques employed to characterise the samples." @default.
- W2467736250 created "2016-07-22" @default.
- W2467736250 creator A5029734726 @default.
- W2467736250 date "2016-01-01" @default.
- W2467736250 modified "2023-09-27" @default.
- W2467736250 title "Al $$_2$$ 2 O $$_3$$ 3 Deposition and Characterisation" @default.
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- W2467736250 doi "https://doi.org/10.1007/978-3-319-32521-7_3" @default.
- W2467736250 hasPublicationYear "2016" @default.
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