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- W2469577836 abstract "Short channel MOS FET's are successfully fabricated by a combination of selfaligned ion implantation and laser annealing, both of poly-Si gate electrodes. The threshold voltage vs. gate length relation and the overlapping capacitance between gate and drain are improved as a result of the extremely small lateral diffusion of implanted atoms." @default.
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- W2469577836 date "1979-01-01" @default.
- W2469577836 modified "2023-09-27" @default.
- W2469577836 title "Short Channel MOS FET's Fabricated by Self-Aligned Ion Implantation and Laser Annealing" @default.
- W2469577836 doi "https://doi.org/10.7567/ssdm.1979.a-3-3" @default.
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