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- W2469747650 abstract "Unlike most organic compounds which undergo ready mineralization on illuminated and oxygenated semiconductors like TiO2, nitroarenes (from dye-, explosives- or polymer production), nitriles or multiply halogenated solvents are inert towards this kind of attack. However, they can be processed if strongly reducing entities are produced in such a semiconductor system. It is shown that the above kinds of refractory pollutants can be treated in formic acid (HCOOH) due to visible irradiation if combined with W, Nb or Bi oxide semiconductor slurries. Toxic functional groups are often removed entirely, e.g. with Hal (≠ aliph. F), CN whereas nitrobenzenes turn into anilinium ions and benzyl groups undergo rearrangement at Nb2O5. The method is broadly applicable and cheap." @default.
- W2469747650 created "2016-07-22" @default.
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- W2469747650 date "2016-06-30" @default.
- W2469747650 modified "2023-09-26" @default.
- W2469747650 title "Releaving Refractory Oxidized Organic Pollutants by Photoelectrochemical Treatment Using Formic Acid as Solvent" @default.
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- W2469747650 doi "https://doi.org/10.15240/tul/004/2016-1-004" @default.
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