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- W247403086 abstract "Thin SiO{sub 2} layers were deposited on the surface of porous Vycor glass by alternating vapor phase reaction with SiCl{sub 4} and H{sub 2}O. The membranes prepared by this technique had H{sub 2} permeance of 0.3--0.4 cm{sup 3} (STP)/(min{center_dot}cm{sup 2}{center_dot}atm) and H{sub 2}:N{sub 2} selectivity of 500--1000 at 600{degrees}C. The SiCl{sub 4} dosage at each silylation cycle, the concentration of initial surface -OH groups, and the reaction temperature influence significantly the deposit layer thickness- After two weeks of heating at 550{degrees}C under 3 atmospheres of water vapor, the membrane H{sub 2} permeance decreased by about 20%, and the selectivity increased to more than 2000. The membrane properties after this hydrothermal treatment are superior to those of membranes prepared earlier by one-sided (steady flow) deposition. A simple model incorporating diffusion and surface reaction was used to study the effect of various parameters on the formation of the deposit layer." @default.
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- W247403086 date "1993-12-31" @default.
- W247403086 modified "2023-10-17" @default.
- W247403086 title "Preparation of H{sub 2}-permselective silica membranes by alternating reactant deposition. Quarterly progress report, September 1, 1993--December 31, 1993" @default.
- W247403086 doi "https://doi.org/10.2172/10143793" @default.
- W247403086 hasPublicationYear "1993" @default.
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