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- W2477538146 abstract "A high numerical aperture (NA) system with an NA larger than 0.5 is required to make patterns of 1X nm and below, even though extreme ultraviolet lithography uses a 13.5-nm wavelength source. To avoid the reflective efficiency loss and to avoid an increase in the chief ray angle of incident light, use of an anamorphic high-NA system is suggested. The suggested anamorphic NA system has nonisotropic magnification, x-magnification of 4× and y-magnification of 8×, and the mask NA shape is an ellipse due to the nonisotropic magnification distribution. Anamorphic NA systems have a nonconventional shadow effect due to nonisotropic incident angle distribution and magnification. These nonisotropic characteristics lead to the reduction of asymmetric shadow distribution and a reduction of horizontal–vertical bias. As a result, anamorphic NA systems can achieve balanced patterning results regardless of pattern direction and incident direction." @default.
- W2477538146 created "2016-08-23" @default.
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- W2477538146 date "2016-08-01" @default.
- W2477538146 modified "2023-09-27" @default.
- W2477538146 title "Anisotropic shadow effects with various pattern directions in an anamorphic high numerical aperture system" @default.
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- W2477538146 doi "https://doi.org/10.1117/1.jmm.15.3.033504" @default.
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