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- W2483684585 abstract "Display Omitted Reviews modeling approaches for DUV and EUV projection lithography.Explains both optical and photoresist models.Demonstrates applications of computational lithography.Provides extensive references to related work in this field. This article reviews modeling approaches for optical and extreme ultraviolet (EUV) projection lithography. It explains the models for the rigorous computation of light diffraction from lithographic masks, a vector formulation of image formation in projection scanners and models for chemical amplified resists (CAR). Several examples demonstrate the application of these models and related computation techniques. It is shown how computational lithography supports innovative optics and material-driven resolution enhancement solutions but also how it helps to comprehend and master the lithographic process." @default.
- W2483684585 created "2016-08-23" @default.
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- W2483684585 date "2015-01-01" @default.
- W2483684585 modified "2023-10-15" @default.
- W2483684585 title "Optical and EUV projection lithography: A computational view" @default.
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