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- W2488412051 abstract "The deprotection kinetics of alicyclic polymer resist systems designed for 193 nm lithography was examined using IR and fluorescence spectroscopic techniques. A kinetic model was developed that simulates the deprotection of the resists fairly well. A new, simple, and reliable method for monitoring photoinduced acid generation in polymer films and in solutions of the kind used in 193 nm and deep-UV lithography was developed. This technique could find application in the study of diffusional processes in thin polymer films." @default.
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- W2488412051 date "1998-09-01" @default.
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- W2488412051 title "Deprotection Kinetics of Alicyclic Polymer Resist Systems Designed for ArF (193 nm) Lithography" @default.
- W2488412051 doi "https://doi.org/10.1021/bk-1998-0706.ch014" @default.
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