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- W2499585410 abstract "Magnetoresistance measurements of (100), (110) and (111) p- and n-channel silicon inversion layers have been carried out at 4.2 K. The dependence on carrier concentration and magnetic field orientation suggests a positive effect which is caused by a mass anisotropy and a negative effect depending on spin scattering in connection with surface states." @default.
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- W2499585410 date "1974-01-01" @default.
- W2499585410 modified "2023-09-23" @default.
- W2499585410 title "Negative and Positive Magnetoresistance Related to Surface States in SiliconInversion Layers" @default.
- W2499585410 cites W1966721114 @default.
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- W2499585410 doi "https://doi.org/10.1007/978-3-322-94774-1_119" @default.
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