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- W2499703989 abstract "We investigate the growth conditions for Selective Area Molecular Beam Epitaxy of GaSb on (001) GaAs inside SiO 2 nano-stripes. We show that the use of an atomic hydrogen flux during the growth promote selective epitaxy at low temperature where a few micron long GaSb nanowires can be obtained both in [110] and [110] orientation. Furthermore, we demonstrate that reducing the Sb/Ga flux ratio during growth leads to an improved GaSb relaxation along [110] and line continuity along [110]." @default.
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- W2499703989 date "2016-06-01" @default.
- W2499703989 modified "2023-09-24" @default.
- W2499703989 title "Selective Area growth of GaSb nano-templates on GaAs (001) using atomic hydrogen assisted Molecular Beam Epitaxy" @default.
- W2499703989 doi "https://doi.org/10.1109/iciprm.2016.7528558" @default.
- W2499703989 hasPublicationYear "2016" @default.
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