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- W2500897519 abstract "A chemically amplified deep UV photoresist system based on acetal chemistry is reported. Acetal-protected poly(vinylphenols) were prepared either by free radical polymerization of the monomers or by chemical modification of poly(vinylphenol). In the presence of an acid as a catalyst, the polymers thermally decomposed to aqueous base soluble poly(vinylphenol) and some small molecules. Therefore, the resists were formulated with the acetal-protected polymers and a photoacid generator such as triphenylsulfonium hexafluoroantimonate. Positive-tone image could be resolved by exposing the resist film in deep UV region, post-baking, and developing in tetramethylammonium hydroxide solutions." @default.
- W2500897519 created "2016-08-23" @default.
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- W2500897519 date "1993-11-23" @default.
- W2500897519 modified "2023-10-05" @default.
- W2500897519 title "Chemically Amplified Deep-UV Photoresists Based on Acetal-Protected Poly(vinylphenols)" @default.
- W2500897519 doi "https://doi.org/10.1021/bk-1994-0537.ch003" @default.
- W2500897519 hasPublicationYear "1993" @default.
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