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- W2503166239 abstract "Theuseofultraviolet(UV)andvacuumultraviolet(VUV)photonsgeneratedfromlow pressureHglampsandexcimerlamps,respectively,toenhancethegrowthofultrathin dielectricsfilms on SiGestrainedlayersand on Siattemperaturesbelow550°Cis describedinthispaper. Thethickness,structure(composition)andelectricalproperties ofthe grown oxide layers were investigated by ellipsometry, Raman and electron spectroscopy, scanning and transmission electron microscopy, Rutherford backscattering, Fourier-transformIRspectroscopy,capacitance-voltageandcurrent voltagemeasurementsinordertocharacterisetheoxidationprocess. TheuseoftheUV and VUV radiationduring the oxidationresultedin significantenhancementsofthe growthratewhencomparedwiththermaloxidation,especiallyforthenovelexcimer lamp sources, which are more powerfullight sources than Hg lamps. Using this technique,highquality,stoichiometricSi02layersweregrownonSiorSicappedSiGe strainedlayers,withoutanymeasurablerelaxationofthestrainedsubstrate. Neweffects such as the formation during the UV-assisted oxidation of SiGe samples of nanocrystalline Ge particles inside the grown oxide layer which exhibit visible photoluminescenceandstresseffectsinducedbytheoxidationprocessarealsopresented." @default.
- W2503166239 created "2016-08-23" @default.
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- W2503166239 date "1998-01-01" @default.
- W2503166239 modified "2023-09-27" @default.
- W2503166239 title "CHALLENGES IN THE OXIDATION OF STRAINED SiGe LAYERS" @default.
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