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- W2510363425 abstract "In order to enhance the etching rate at lower pressure, an electron-beam assisted inductively coupled plasma (ICP) reactor was developed, in which the electron-beam was injected into the reactor through a thin polymer film, and a pattern of 0.2μm was etched on an Si wafer. We discussed the peculiarities of plasma produced by the above reactor in comparison with the data we got as a result of probe measurements. It was found that the electron-beam injection into the ICP decreases the floating and the plasma potentials and increases the electron temperature and the density slightly." @default.
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- W2510363425 date "1996-01-01" @default.
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- W2510363425 title "Electron-Beam Assisted Inductively Coupled Plasma for Quarter-Micron Etching Processes" @default.
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- W2510363425 doi "https://doi.org/10.1541/ieejfms1990.116.11_978" @default.
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