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• W2510930250 abstract "In the present study, the <TEX>$CuN_x-Cu-CuN_x$</TEX> layer the partial pressure ratio Cu metal of Ar and <TEX>$N_2$</TEX> gas using a DC magnetron sputtering device, was generated by the In-situ method. <TEX>$CuN_x$</TEX> layer was able to obtain a surface reflectance reduction effect from the advantages of the process and the external light. <TEX>$CuN_x$</TEX> layer is gas partial pressure, DC the Power, the deposition time variable transmittance in response to the thickness and partial pressure ratio, the reflectance was measured. <TEX>$Ar:N_2$</TEX> gas ratio 10:10(sccm), DC power 0.35 A, was derived Deposition time 90 sec optimum conditions. Thus, according to the optimal thickness and the composition ratio was derived surface reflectance of 20.75%. In addition, to derive the value of <TEX>${Delta}$</TEX> Ra surface roughness of 0.467. It was derived <TEX>$CuN_x$</TEX> band-gap energy of about 2.2 eV. Thus, to ensure a thickness and process conditions can be absorbed to maximize the light in a wavelength band in the visible light region. As a result, the implementation of the <TEX>$12k{Omega}$</TEX> base line resistance of using the Cu metal. This is, 5 inch Metal mesh TSP(L/S: <TEX>$4/270{mu}m$</TEX>) is in the range of the reference operation." @default.
• W2510930250 created "2016-09-16" @default.
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• W2510930250 date "2016-07-01" @default.
• W2510930250 modified "2023-09-28" @default.
• W2510930250 title "A Study on the Metal Mesh for CuNx-Cu-CuNxMulti-layer Touch Electrode by Reactive Magnetron Sputtering" @default.
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• W2510930250 doi "https://doi.org/10.4313/jkem.2016.29.7.414" @default.
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