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- W2517507754 abstract "This work studies the influence of the HALO implantation on the occurrence of the self-heating effect and self-heating assisted impact ionization in a deep submicrometer partially depleted SOI technology with floating-body from room temperature down to 90 K. For the nMOSFETs, the HALO region causes a negative output conductance both at reduced and high gate overdrive voltages while the non-HALO devices do not exhibit such an effect. For the pMOSFETs, the HALO region does not induce a negative output conductance region." @default.
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- W2517507754 date "2003-01-01" @default.
- W2517507754 modified "2023-09-24" @default.
- W2517507754 title "Analysis of HALO implant influence on the self-heating and self-heating ennhanced impact ionization on 0.13 μm floating-body partially-depleted SOI MOSFET at low temperature" @default.
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