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- W2520098051 abstract "Bi 4 Ti 3 O 12 thin films were prepared by MOCVD method using triorthotolyl-bismuth, Bi(o-C 7 H 7 ) 3 , and diisopropoxy-bis-(di-pivaloylmetanato)-titanium, Ti(i-OC 3 H 7 ) 2 (DPM) 2 , as the metalorganic sources. Thin films obtained were characterized by XRD analysis and SEM observation. Bi 4 Ti 3 O 12 thin films with high c-axis orientation and most of single phase were deposited on Pt/Ti/SiO 2 /Si and Pt substrates above 500°C in air. Use of newly developed Bi(o-C 7 H 7 ) 3 and Ti(i-OC 3 H 7 ) 2 (DPM) 2 instead of normally used Bi(C 6 H 5 ) 3 and Ti(i-OC 3 H 7 ) 4 was advantageous in fabricating Bi 4 Ti 3 O 12 thin films with c-axis orientation at lower temperatures" @default.
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- W2520098051 date "1994-05-01" @default.
- W2520098051 modified "2023-09-25" @default.
- W2520098051 title "Preparation of Bi4Ti3O12 thin films with c-axis orientation by MOCVD using Bi(o-C7H7)3 and Ti(i-OC3H7)2(DPM)2" @default.
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