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• W2524302570 startingPage "1031" @default.
• W2524302570 abstract "Data in the form of spatial point patterns are frequently encountered in some manufacturing processes such as the nanoparticle reinforced composite materials and defects on semiconductor wafers. Their spatial characteristics contain rich information about the fabrication processes and are often strongly related to the product quality. The distributional characteristics of a spatial point pattern can be summarized by functional profiles such as the popular Ripley's K function. By analyzing the K function, we can effectively monitor the distributional behaviors of the spatial point data. In this study, statistical properties of the K function are investigated, and a Gaussian process is found to be appropriate in characterizing its behavior under complete spatial randomness. A control chart is proposed based on the results to monitor the uniformity of point patterns. Our proposed approach has been compared with existing methods through numerical simulations and shown superior performances." @default.
• W2524302570 created "2016-10-07" @default.
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• W2524302570 date "2017-04-01" @default.
• W2524302570 modified "2023-10-17" @default.
• W2524302570 title "Monitoring Spatial Uniformity of Particle Distributions in Manufacturing Processes Using the K Function" @default.
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• W2524302570 doi "https://doi.org/10.1109/tase.2015.2479088" @default.
• W2524302570 hasPublicationYear "2017" @default.
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