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• W2524890288 endingPage "115014" @default.
• W2524890288 startingPage "115014" @default.
• W2524890288 abstract "This paper reports the formation of TiO2 patterns with a wide range of photo-induced wettability switching from high hydrophobic to superhydrophilic states for on-chip liquid manipulation. TiO2 thin films with rough surface morphology were formed by a combination of optimised reactive sputtering and CF4 plasma etching. Octadecylphosphonic acid self-assembled monolayer (ODP-SAM) surface modification was applied to the surface-roughened TiO2 thin films in order to obtain a highly hydrophobic surface initially. Photocatalytic decomposition of ODP-SAM on the surface-roughened TiO2 by ultraviolet (UV) irradiation caused a wetting transition from the Cassie?Baxter state to the Wenzel state. Switching of the flow direction into branch channels was also demonstrated by utilising the photoresponsive wettability of the surface-modified TiO2 patterns on a fluidic chip." @default.
• W2524890288 created "2016-10-07" @default.
• W2524890288 creator A5032667985 @default.
• W2524890288 creator A5062644688 @default.
• W2524890288 date "2015-10-06" @default.
• W2524890288 modified "2023-09-30" @default.
• W2524890288 title "TiO₂patterns with wide photo-induced wettability change by a combination of reactive sputtering process and surface modification in a microfluidic channel" @default.
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• W2524890288 doi "https://doi.org/10.1088/0960-1317/25/11/115014" @default.
• W2524890288 hasPublicationYear "2015" @default.
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