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• W2528231504 endingPage "24032" @default.
• W2528231504 startingPage "24032" @default.
• W2528231504 abstract "The aim of this article is to determine the best dielectric between SiO2, Si3N4 and TiO2 for quantum cascade laser (QCL) passivation layers depending on the operation wavelength. It relies on both Mueller ellipsometry measurement to accurately determine the optical constants (the refractive index n and the extinction coefficient k) of the three dielectrics, and optical simulations to determine the mode overlap with the dielectric and furthermore the modal losses in the passivation layer. The impact of dielectric thermal conductivities are taken into account and shown to be not critical on the laser performances." @default.
• W2528231504 created "2016-10-14" @default.
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• W2528231504 date "2016-10-07" @default.
• W2528231504 modified "2023-10-16" @default.
• W2528231504 title "Comparative study of SiO_2, Si_3N_4 and TiO_2 thin films as passivation layers for quantum cascade lasers" @default.
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• W2528231504 doi "https://doi.org/10.1364/oe.24.024032" @default.
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